Velength electrostatic NAWs propagating along the GYKI 52466 Epigenetic Reader Domain magnetic lines of force of
Velength electrostatic NAWs propagating along the magnetic lines of force of white dwarfs and non-rotating neutron stars.Funding: This research received no external funding. Acknowledgments: The function is committed to an eminent space and astrophysicist, Reinhard Schlickeiser, who supervised the author through his analysis keep at Ruhr Universit Bochum (Germany) as a Friedrich Wilhelm Bessel Research Awardee, on the occasion of his 70th Birth Anniversary. The author wishes him an extremely long active and cherished life around the same occasion. Conflicts of Interest: The author declares no conflict of interest.
applied sciencesTechnical NoteDual-Frequency Microwave Compound 48/80 Biological Activity Plasma Supply Determined by Microwave Coaxial Transmission LineChi Chen , Wenjie Fu , Chaoyang Zhang , Dun Lu , Meng Han and Yang YanSchool of Electronic Science and Engineering, University of Electronic Science and Technology of China, Chengdu 610054, China; [email protected] (C.C.); [email protected] (C.Z.); [email protected] (D.L.); [email protected] (M.H.); [email protected] (Y.Y.) Correspondence: [email protected] Application: In many microwave plasma fields, which include Microwave Plasma Chemical Vapor Deposition (MPCVD), the dual-frequency plasma supply could be used to manage plasma characteristics flexibly. Abstract: A dual-frequency plasma source has a lot of benefits in applications. Within this paper, a dual-frequency microwave plasma source is presented. This microwave plasma source is according to a coaxial transmission line without having the resonator, and it may be operated in a wide band frequency area. Two microwaves are inputted from two ports into the plasma reactor: a single is utilized firstly to excite the plasma and also the other a single is made use of to adjust plasma qualities. According to the COMSOL Multiphysics simulation, the experiment is carried out. In the experimental investigation, the plasma electron density and electron temperature may be controlled, respectively, by feeding in various frequencies from the second port, causing the particles at different power levels to present different frequencies. This exploratory analysis improves the operation frequency of dual-frequency microwave plasma sources from RF to microwave. Keywords: microwave plasma; dual-frequency plasma; electron temperature; electron densityCitation: Chen, C.; Fu, W.; Zhang, C.; Lu, D.; Han, M.; Yan, Y. DualFrequency Microwave Plasma Supply Based on Microwave Coaxial Transmission Line. Appl. Sci. 2021, 11, 9873. https://doi.org/10.3390/ app11219873 Academic Editor: Mariusz Jasinski Received: 6 October 2021 Accepted: 19 October 2021 Published: 22 October1. Introduction To control plasma characteristics flexibly, the dual-frequency plasma supply has been proposed and investigated [1]. The dual-frequency plasma source is often a hybrid source, in which 1 frequency is chosen to become a lot higher than the other as a way to obtain independent control of ion bombardment and electron density [9]. Study shows that, in plasma etching, dual-frequency operating could reduce particle contamination inside the plasma reactor [10], and in the plasma-enhanced chemical vapor deposition (PECVD), dualfrequency operating could increase the film strain, step coverage, chemical composition, and film stability [114]. In previous research, the exciting frequency for dual-frequency plasma sources largely were mainly radio frequency (RF), like 13.56 MHz, 27.12 MHz, 320 MHz, 340 kHz, and 40 kHz, and also the.
